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Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films
| File | Description | Size | Format | |
|---|---|---|---|---|
 043 Napari Antiferromagnetism and p-type conductivity of nonstoichiometric nicek oxide thin films.pdf | Published version | 1.05 MB | Adobe PDF | View/Open |
| Title: | Antiferromagnetism and p‐type conductivity of nonstoichiometric nickel oxide thin films |
| Authors: | Napari, M Huq, TN Maity, T Gomersall, D Niang, KM Barthel, A Thompson, JE Kinnunen, S Arstila, K Sajavaara, T Hoye, RLZ Flewitt, AJ MacManus‐Driscoll, JL |
| Item Type: | Journal Article |
| Abstract: | Plasma‐enhanced atomic layer deposition was used to grow non‐stoichiometric nickel oxide thin films with low impurity content, high crystalline quality, and p‐type conductivity. Despite the non‐stoichiometry, the films retained the antiferromagnetic property of NiO. |
| Issue Date: | 1-Jul-2020 |
| Date of Acceptance: | 28-Nov-2019 |
| URI: | http://hdl.handle.net/10044/1/76234 |
| DOI: | 10.1002/inf2.12076 |
| ISSN: | 2567-3165 |
| Start Page: | 769 |
| End Page: | 774 |
| Journal / Book Title: | Infomat |
| Volume: | 2 |
| Issue: | 4 |
| Copyright Statement: | © 2020 The Authors. InfoMat published by John Wiley & Sons Australia, Ltd on behalf of UESTC. This is an open access article under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0/), which permits use, distribution and reproduction in any medium, provided the original work is properly cited. |
| Sponsor/Funder: | Magdalene College, University of Cambridge Royal Academy of Engineering Royal Academy Of Engineering |
| Funder's Grant Number: | RF\201718\17101 RF\201718\17101 |
| Publication Status: | Published |
| Article Number: | inf2.12076 |
| Online Publication Date: | 2020-01-17 |
| Appears in Collections: | Materials Faculty of Engineering |