Monolithic MEMS quadrupole mass spectrometers by deep silicon etching

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Title: Monolithic MEMS quadrupole mass spectrometers by deep silicon etching
Authors: Geear,M.
Syms,R.R.A.
Wright,S.
Holmes,A.S.
Item Type: Journal Article
Content Version: Published version
Issue Date: 1-Oct-2005
Citation: Journal of Microelectromechanical Systems Vol.( 14 ) No.( 5 ) pp 1156 - 1166
URI: http://hdl.handle.net/10044/1/1010
Publisher Link: http://dx.doi.org/10.1109/JMEMS.2005.851799
ISSN: 1057-7157
Start Page: 1156
End Page: 1166
Copyright Statement: © 2005 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder.
Volume: 14
Appears in Collections:Optical and Semiconductor Devices



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