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Titanium oxynitride thin films with tuneable double epsilon-near-zero behaviour for nanophotonic applications

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Title: Titanium oxynitride thin films with tuneable double epsilon-near-zero behaviour for nanophotonic applications
Authors: Braic, L
Vasilantonakis, N
Mihai, A
Villar-Garcia, I
Fearn, S
Zou, B
Alford, N
Doiron, B
Oulton, R
Maier, S
Zayats, A
Petrov, P
Item Type: Journal Article
Abstract: Titanium oxynitride (TiOxNy) thin films are fabricated using reactive magnetron sputtering. The mechanism of their growth formation is explained, and their optical properties are presented. The films grown when the level of residual oxygen in the background vacuum was between 5 nTorr to 20 nTorr exhibit double epsilon-near-Zero (2-ENZ) behavior with ENZ1 and ENZ2 wavelengths tunable in the 700–850 and 1100–1350 nm spectral ranges, respectively. Samples fabricated when the level of residual oxygen in the background vacuum was above 2 × 10–8 Torr exhibit nonmetallic behavior, while the layers deposited when the level of residual oxygen in the background vacuum was below 5 × 10–9 Torr show metallic behavior with a single ENZ value. The double ENZ phenomenon is related to the level of residual oxygen in the background vacuum and is attributed to the mixture of TiN and TiOxNy and TiOx phases in the films. Varying the partial pressure of nitrogen during the deposition can further control the amount of TiN, TiOx, and TiOxNy compounds in the films and, therefore, tune the screened plasma wavelengths. A good approximation of the ellipsometric behavior is achieved with Maxwell–Garnett theory for a composite film formed by a mixture of TiO2 and TiN phases suggesting that double ENZ TiOxNy films are formed by inclusions of TiN within a TiO2 matrix. These oxynitride compounds could be considered as new materials exhibiting double ENZ in the visible and near-IR spectral ranges. Materials with ENZ properties are advantageous for designing the enhanced nonlinear optical response, metasurfaces, and nonreciprocal behavior.
Issue Date: 18-Aug-2017
Date of Acceptance: 18-Aug-2017
URI: http://hdl.handle.net/10044/1/52727
DOI: https://dx.doi.org/10.1021/acsami.7b07660
ISSN: 1944-8244
Publisher: American Chemical Society
Start Page: 29857
End Page: 29862
Journal / Book Title: ACS Applied Materials and Interfaces
Volume: 9
Issue: 35
Copyright Statement: © 2017 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in ACS Applied Materials and Interfaces, after peer review and technical editing by the publisher. To access the final edited and published work see https://dx.doi.org/10.1021/acsami.7b07660
Sponsor/Funder: Engineering & Physical Science Research Council (E
The Leverhulme Trust
Engineering & Physical Science Research Council (EPSRC)
Engineering & Physical Science Research Council (E
Technology Strategy Board
Engineering & Physical Science Research Council (EPSRC)
Engineering & Physical Science Research Council (E
Funder's Grant Number: EP/F012403/1
F/07 058AL
EP/G031819/1
EP/H000917/1
TP/8/MAT/6/I/Q1527C
EP/M020398/1
EP/M013812/1
Keywords: Science & Technology
Technology
Nanoscience & Nanotechnology
Materials Science, Multidisciplinary
Science & Technology - Other Topics
Materials Science
plasmonics
titanium nitride
titanium oxynitride
thin films
epsilon near zero
nonlinear photonics
ALTERNATIVE PLASMONIC MATERIALS
RAY PHOTOELECTRON-SPECTROSCOPY
NITRIDE
METAMATERIALS
TIN
NONLINEARITY
WAVELENGTHS
COATINGS
GROWTH
OXIDES
cond-mat.mtrl-sci
0904 Chemical Engineering
0303 Macromolecular And Materials Chemistry
0306 Physical Chemistry (Incl. Structural)
Publication Status: Published
Appears in Collections:Materials
Physics
Experimental Solid State
Faculty of Natural Sciences



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