Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy

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Title: Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy
Authors: Woodward, RI
Murray, RT
Phelan, CF
De Oliveira, REP
Li, S
Eda, G
De Matos, CJS
Item Type: Conference Paper
Abstract: Second- and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the materials nonlinearity. A telecommunication wavelength pump is used, revealing the materials promise for use in nonlinear optical devices.
Issue Date: 5-Jun-2016
Date of Acceptance: 21-Mar-2016
URI: http://hdl.handle.net/10044/1/31005
DOI: http://dx.doi.org/10.1364/CLEO_SI.2016.STu1R.3
ISBN: 978-1-943580-11-8
Publisher: OSA
Start Page: STu1R.3
End Page: STu1R.3
Journal / Book Title: Proceedings of the 2016 Conference on Lasers and Electro-Optics
Copyright Statement: © 2016 OSA
Conference Name: CLEO:2016 Laser Science to Photonic Applications
Publication Status: Published
Start Date: 2016-06-05
Finish Date: 2016-06-10
Conference Place: San Jose, California USA
Appears in Collections:Physics
Photonics
Faculty of Natural Sciences



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