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Defect processes in F and Cl doped anatase TiO2
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s41598-019-55518-8.pdf | Published version | 2.94 MB | Adobe PDF | View/Open |
Title: | Defect processes in F and Cl doped anatase TiO2 |
Authors: | Filippatos, PP Kelaidis, N Vasilopoulou, M Davazoglou, D Lathiotakis, NN Chroneos, A |
Item Type: | Journal Article |
Abstract: | Titanium dioxide represents one of the most widely studied transition metal oxides due to its high chemical stability, non-toxicity, abundance, electron transport capability in many classes of optoelectronic devices and excellent photocatalytic properties. Nevertheless, the wide bang gap of pristine oxide reduces its electron transport ability and photocatalytic activity. Doping with halides and other elements has been proven an efficient defect engineering strategy in order to reduce the band gap and maximize the photocatalytic activity. In the present study, we apply Density Functional Theory to investigate the influence of fluorine and chlorine doping on the electronic properties of TiO2. Furthermore, we present a complete investigation of spin polarized density functional theory of the (001) surface doped with F and Cl in order to elaborate changes in the electronic structure and compare them with the bulk TiO2. |
Issue Date: | 27-Dec-2019 |
Date of Acceptance: | 11-Nov-2019 |
URI: | http://hdl.handle.net/10044/1/75243 |
DOI: | 10.1038/s41598-019-55518-8 |
ISSN: | 2045-2322 |
Publisher: | Nature Publishing Group |
Journal / Book Title: | Scientific Reports |
Volume: | 9 |
Copyright Statement: | © The Author(s) 2019. This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. |
Publication Status: | Published |
Article Number: | ARTN 19970 |
Appears in Collections: | Materials Faculty of Engineering |
This item is licensed under a Creative Commons License