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High Vacuum Deposition of Biferrocene Thin Films on Room Temperature Substrates

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Title: High Vacuum Deposition of Biferrocene Thin Films on Room Temperature Substrates
Authors: Leber, R
Wilson, LE
Robaschik, P
Inkpen, MS
Payne, DJ
Long, NJ
Albrecht, T
Hirjibehedin, CF
Heutz, S
Item Type: Journal Article
Abstract: Metallocenes are a promising candidate for future spintronic devices due to their versatile and tunable magnetic properties. However, single metallocenes, e.g., ferrocene, sublimate below room temperature, and therefore the implementation for future applications is challenging. Here, a method to prepare biferrocene thin films using organic molecular beam deposition (OMBD) is presented, and the effect of substrate and deposition rate on the film structure and morphology as well as its chemical and magnetic properties is investigated. On Kapton and Si substrates, biferrocene interacts only weakly with the substrate, and distinct grains scattered over the surface are observed. By incorporating a 3,4,9,10-perylenetetracarboxylic dianhydride (PTCDA) seeding layer and depositing biferrocene at high deposition rates of 1.0 Å s–1, it is possible to achieve a well-ordered densely packed film. With spintronic applications in mind, the magnetic properties of the thin films are characterized using superconducting quantum interference device (SQUID) magnetometry. Whereas initial SQUID measurements show weak ferromagnetic behavior up to room temperature due to oxidized molecule fragments, measurements of biferrocene on PTCDA capped with LiF show the diamagnetic behavior expected of biferrocene. Through the successful deposition of biferrocene thin films and the ability to control the spin state, these results demonstrate a first step toward metallocene-based spintronics.
Issue Date: 13-Sep-2017
Date of Acceptance: 25-Aug-2017
URI: http://hdl.handle.net/10044/1/53018
DOI: https://dx.doi.org/10.1021/acs.chemmater.7b02614
ISSN: 0897-4756
Publisher: American Chemical Society
Start Page: 8663
End Page: 8669
Journal / Book Title: Chemistry of Materials
Volume: 29
Issue: 20
Copyright Statement: © 2017 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Chemistry of Materials, after peer review and technical editing by the publisher. To access the final edited and published work see https://dx.doi.org/10.1021/acs.chemmater.7b02614
Keywords: 03 Chemical Sciences
09 Engineering
Publication Status: Published
Appears in Collections:Materials
Faculty of Natural Sciences
Faculty of Engineering