Investigating the beneficial effects of a WO3 seed layer on the mechanical and photoelectrochemical stability of WO3|BiVO4|NiFeOOH photoanodes under operational conditions
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Published version
Author(s)
Creasey, George H
Kafizas, Andreas
Hankin, Anna
Type
Journal Article
Abstract
Scalable and durable photoelectrodes are essential for technological breakthroughs in photoelectrochemical systems, yet the fragility of nanostructured photocatalyst materials in industrially relevant operating conditions is rarely explored. Herein, we advance understanding of the importance of morphology and temperature on stability and performance of nanostructured WO3|BiVO4|NiFeOOH photoanodes. The integration of a planar WO3 seed layer beneath nanostructured WO3, improved mechanical stability at 40°C with flowing electrolyte approximately twofold compared with materials where a seed layer was not integrated. This work provides a pathway through which robust photoelectrode systems can be engineered to enable the advancement of up-scaled photoelectrochemical water splitting.
Date Issued
2025-08-01
Date Acceptance
2025-07-22
Citation
MRS Communications, 2025, 15 (4), pp.721-730
ISSN
2159-6859
Publisher
Materials Research Society
Start Page
721
End Page
730
Journal / Book Title
MRS Communications
Volume
15
Issue
4
Copyright Statement
© The Author(s), 2025 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.
License URL
Identifier
https://www.ncbi.nlm.nih.gov/pubmed/41040980
PII: 788
Subjects
Adhesion
Bi
BIVO4
Chemical vapor deposition (CVD)
Devices
Durability
Heterostructure
Hybrid
Kinetics
Materials Science
Materials Science, Multidisciplinary
Morphology
Nanostructure
Oxidation
Oxide
Photoelectrochemical
Renewable
Science & Technology
Semiconducting
Technology
V
Publication Status
Published
Coverage Spatial
United States
Date Publish Online
2025-08-18