Dark field imaging of high aspect ratio structures - a simple model
File(s)
Published version
OA Location
Author(s)
Syms, Richard RA
Kwan, Fu Yee
Sydoruk, Oleksiy
Type
Journal Article
Abstract
A simplified model for dark-field optical imaging of three-dimensional high aspect ratio micro- and nano- structures is proposed, to reduce the time taken to simulate object fields with in-plane scattering between different parts of the object. Primary scattering is found by assuming that illumination of Manhattan geometries generates a set of spherical edge waves, following the incremental theory of diffraction. Secondary scattering is found by assuming that primary scattering is re-scattered from nearby features. Diffraction coefficients are simplified, and the number of illuminating beams is limited to those generating waves that enter the objective lens. Images obtained using TE and TM polarizations are compared, and results are benchmarked against a vectorial finite element model. Applications lie in simulating optical inspection of structures containing vertically etched features including MEMS and NEMS.
Date Issued
2023-11-06
Date Acceptance
2023-10-26
Citation
Optics Express, 2023, 31 (23), pp.39279-39291
ISSN
1094-4087
Publisher
Optical Society of America (OSA)
Start Page
39279
End Page
39291
Journal / Book Title
Optics Express
Volume
31
Issue
23
Copyright Statement
Journal © 2023. Published by Optica Publishing Group under the terms of the Creative Commons Attribution 4.0 License. Further distribution of this work must maintain attribution to the author(s) and the published article’s title, journal citation, and DOI.
License URL
Identifier
10.1364/OE.504830
Subjects
COEFFICIENTS
EDGE-DIFFRACTION
EFFICIENT
GEOMETRICAL-THEORY
IMAGES
MICROSCOPY
NUMERICAL-SIMULATION
Optics
Physical Sciences
SCATTERING
Science & Technology
WAVE
Publication Status
Published
Article Number
504830
Date Publish Online
2023-11-03