Hybrid modulation-doping of solution-processed ultrathin layers of ZnO using molecular dopants
File(s)Schiebl et_al-2015_Advanced_Materials 2015_ASAP.pdf (2.33 MB)
Accepted version
Author(s)
Type
Journal Article
Abstract
An alternative doping approach that exploits the use of organic donor/acceptor molecules for the effective tuning of the free electron concentration in quasi 2D ZnO transistor channel layers is reported. The method relies on the deposition of molecular dopants/formulations directly onto the ultrathin ZnO channels. Through careful choice of materials combinations, electron transfer from the dopant molecule to ZnO and vice versa is demonstrated.
Date Issued
2015-10-05
Date Acceptance
2015-08-10
Citation
Advanced Materials, 2015, 28 (20), pp.3952-3959
ISSN
1521-4095
Publisher
Wiley-VCH Verlag
Start Page
3952
End Page
3959
Journal / Book Title
Advanced Materials
Volume
28
Issue
20
Copyright Statement
This is the peer reviewed version of the following article: Schießl, S. P., Faber, H., Lin, Y.-H., Rossbauer, S., Wang, Q., Zhao, K., Amassian, A., Zaumseil, J. and Anthopoulos, T. D. (2015), Hybrid Modulation-Doping of Solution-Processed Ultrathin Layers of ZnO Using Molecular Dopants. Adv. Mater., which has been published in final form at https://dx.doi.org/10.1002/adma.201503200. This article may be used for non-commercial purposes in accordance With Wiley Terms and Conditions for self-archiving.
Subjects
doping
metal oxide semiconductors
modulation doping
molecular doping
organic semiconductors
Publication Status
Published