Characterization of the nonlinear susceptibility of monolayer MoS2 using second- and third-harmonic generation microscopy
File(s)cleo_mos2_harmonic.pdf (1.15 MB)
Accepted version
Author(s)
Type
Conference Paper
Abstract
Second- and third-harmonic generation microscopy of monolayer MoS2 is reported for imaging and characterization of the material's nonlinearity. A telecommunication wavelength pump is used, revealing the material's promise for use in nonlinear optical devices.
Date Issued
2016-06-05
Date Acceptance
2016-03-21
Citation
Proceedings of the 2016 Conference on Lasers and Electro-Optics, 2016, pp.STu1R.3-STu1R.3
ISBN
978-1-943580-11-8
Publisher
OSA
Start Page
STu1R.3
End Page
STu1R.3
Journal / Book Title
Proceedings of the 2016 Conference on Lasers and Electro-Optics
Copyright Statement
© 2016 OSA
Source
CLEO:2016 Laser Science to Photonic Applications
Publication Status
Published
Start Date
2016-06-05
Finish Date
2016-06-10
Coverage Spatial
San Jose, California USA