Deuterium ion implantation of Eurofer with a new pulsed DC plasma source
File(s)
Published version
Author(s)
Pittard, JA
Smith, JA
Zafra, A
Martínez-Pañeda, E
Fox, NA
Type
Journal Article
Abstract
A new low energy ion source was developed. ExTEnD (Exposure to Low Energy Deuterium) uses an electrical discharge to create a plasma from which ions can be extracted via a biased sample stage - offering a simple and accessible setup to perform low energy ion exposure for hydrogen retention studies. Careful selection of operating conditions allowed stage current measurements to be used to estimate fluence, whilst the bias applied to the stage dictated the incident ion energy. The design and testing of ExTEnD is presented, alongside a preliminary study in which ion flux incident on Eurofer samples was varied in two ways. Thermal desorption results were broadly in good agreement with a variety of other studies, with three commonly observed desorption peaks present across the samples. The longer exposure time of the lowest flux sample resulted in a notable increase in retained deuterium.
Date Issued
2025-11-01
Date Acceptance
2025-07-05
Citation
Fusion Engineering and Design, 2025, 220
ISSN
0920-3796
Publisher
Elsevier
Journal / Book Title
Fusion Engineering and Design
Volume
220
Copyright Statement
© 2025 The Authors. Published by Elsevier B.V. This is an open access article under the CC BY license (http://creativecommons.org/licenses/by/4.0/).
License URL
Identifier
10.1016/j.fusengdes.2025.115321
Publication Status
Published
Article Number
115321
Date Publish Online
2025-07-10