Chemical vapour deposition (CVD) of nickel oxide using the novel nickel dialkylaminoalkoxide precursor [Ni(dmamp′)2] (dmamp′ = 2-dimethylamino-2-methyl-1-propanolate)
File(s)
Published version
Author(s)
Type
Journal Article
Abstract
Nickel oxide (NiO) has good optical transparency and wide band-gap, and due to the particular alignment of valence and conduction band energies with typical current collector materials has been used in solar cells as an efficient hole transport-electron blocking layer, where it is most commonly deposited via sol–gel or directly deposited as nanoparticles. An attractive alternative approach is via vapour deposition. This paper describes the chemical vapour deposition of p-type nickel oxide (NiO) thin films using the new nickel CVD precursor [Ni(dmamp′)2], which unlike previous examples in literature is synthesised using the readily commercially available dialkylaminoalkoxide ligand dmamp′ (2-dimethylamino-2-methyl-1-propanolate). The use of vapour deposited NiO as a blocking layer in a solar-cell device is presented, including benchmarking of performance and potential routes to improving performance to viable levels.
Date Issued
2021-06-23
Date Acceptance
2021-06-15
Citation
RSC Advances: an international journal to further the chemical sciences, 2021, 11 (36), pp.22199-22205
ISSN
2046-2069
Publisher
Royal Society of Chemistry
Start Page
22199
End Page
22205
Journal / Book Title
RSC Advances: an international journal to further the chemical sciences
Volume
11
Issue
36
Copyright Statement
© 2021 The Author(s). Published by the Royal Society of Chemistry. This article is licensed under a Creative Commons Attribution 3.0 Unported Licence.
License URL
Identifier
https://pubs.rsc.org/en/content/articlelanding/2021/RA/D1RA03263A#!divAbstract
Subjects
03 Chemical Sciences
Publication Status
Published
Date Publish Online
2021-06-23