Improved optical imaging of high aspect ratio nanostructures using dark-field microscopy
File(s)
Accepted version
Author(s)
Syms, RRA
Sydoruk, Oleksiy
Bouchaala, Adam
Type
Journal Article
Abstract
Improvements to white light optical imaging of widely spaced, high aspect ratio nanostructures are demonstrated using dark-field field microscopy. 1D models of bright- and dark-field imaging are developed from rigorous modal diffraction theory by assuming that features are periodic. A simple model is developed to explain dark field results and simulated line images obtained using the two modalities are compared for different dimensions and materials. Increased contrast between etched features and the substrate is demonstrated in dark field, due to its reduced sensitivity to scattering from flat areas. The results are verified using silicon nanostructures fabricated by sidewall transfer lithography, and feature separation with improved tolerance to apparent substrate brightness is demonstrated during image segmentation using the Otsu method.
Date Issued
2019-07-12
Date Acceptance
2019-03-27
Citation
Nanotechnology, 2019, 30 (28)
ISSN
0957-4484
Publisher
IOP Publishing
Journal / Book Title
Nanotechnology
Volume
30
Issue
28
Copyright Statement
© 2019 IOP Publishing Ltd. This is an author-created, un-copyedited version of an article accepted for publication in Nanotechnology. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The definitive publisher authenticated version is available online at https://iopscience.iop.org/article/10.1088/1361-6528/ab13de/meta
Identifier
https://www.ncbi.nlm.nih.gov/pubmed/30917352
Subjects
Image segmentation
MEMS
NEMS
Sub-wavelength imaging
Publication Status
Published
Coverage Spatial
England
Article Number
285301
Date Publish Online
2019-04-24