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  5. Liquizald─thermally stable N-nitrosamine precursor for diazomethane
 
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Liquizald─thermally stable N-nitrosamine precursor for diazomethane
File(s)
horvath-gerber-et-al-2024-liquizald-thermally-stable-n-nitrosamine-precursor-for-diazomethane.pdf (3.25 MB)
Published version
Author(s)
Horvath-Gerber, Filip
Ohlig, Dominik
Hii, King Kuok Mimi
Deadman, Benjamin
Attrill, Robin P
more
Type
Journal Article
Abstract
N-Methyl-N-nitroso-p-toluenesulfonamide (Diazald) and N-nitroso-β-methylaminoisobutyl methyl ketone (Liquizald) were compared in this study as diazomethane precursors for process scale-up. Thermal assessment flagged Diazald for explosion propagation and impact sensitivity using the Yoshida methodology, while Liquizald only indicated potential for impact sensitivity under more conservative Pfizer correlations. A higher onset temperature of Liquizald at 170 °C was determined. Compared to the onset temperature for Diazald (80 °C), Liquizald made a favorable candidate for exploitation of increased reaction rates at high temperatures using microreactor technologies. New kinetic parameters of decomposition were further used to study the potential for process intensification and identify the microreactor channel sizing for thermally stable and near-isothermal reactor operation.
Date Issued
2024-02-16
Date Acceptance
2024-01-11
Citation
Organic Process Research and Development, 2024, 28 (2), pp.597-608
URI
http://hdl.handle.net/10044/1/112404
URL
http://dx.doi.org/10.1021/acs.oprd.3c00456
DOI
https://www.dx.doi.org/10.1021/acs.oprd.3c00456
ISSN
1520-586X
Publisher
American Chemical Society
Start Page
597
End Page
608
Journal / Book Title
Organic Process Research and Development
Volume
28
Issue
2
Copyright Statement
Copyright © 2024 The Authors. Published by American Chemical Society. This publication is licensed under
CC-BY 4.0.
License URL
https://creativecommons.org/licenses/by/4.0/
Identifier
http://dx.doi.org/10.1021/acs.oprd.3c00456
Publication Status
Published
Date Publish Online
2024-01-26
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