Sub-100 nm wrinkling of polydimethylsiloxane by double frontal oxidation
File(s)Nania_Nanoscale2017.pdf (2.39 MB)
Accepted version
Author(s)
Nania, M
Foglia, F
Matar, OK
Cabral, JT
Type
Journal Article
Abstract
We demonstrate nanoscale wrinkling on polydimethylsiloxane (PDMS) at sub-100 nm length scales via a
(double) frontal surface oxidation coupled with a mechanical compression. The kinetics of the glassy skin
propagation is resolved by neutron and X-ray reflectivity, and atomic force microscopy, combined with
mechanical wrinkling experiments to evaluate the resulting pattern formation. In conventional PDMS
surface oxidation, the smallest wrinkling patterns attainable have an intrinsic lower wavelength limit due
to the coupling of skin formation and front propagation at fixed strain εprestrain, whose maximum is, in
turn, set by material failure. However, combining two different oxidative processes, ultra-violet ozonolysis
followed by air plasma exposure, we break this limit by fabricating trilayer laminates with excellent interfacial
properties and a sequence of moduli and layer thicknesses able to trivially reduce the surface topography
to sub-100 nm dimensions. This method provides a powerful, yet simple, non-lithographic
approach to extend surface patterning from visible to the deep UV range.
(double) frontal surface oxidation coupled with a mechanical compression. The kinetics of the glassy skin
propagation is resolved by neutron and X-ray reflectivity, and atomic force microscopy, combined with
mechanical wrinkling experiments to evaluate the resulting pattern formation. In conventional PDMS
surface oxidation, the smallest wrinkling patterns attainable have an intrinsic lower wavelength limit due
to the coupling of skin formation and front propagation at fixed strain εprestrain, whose maximum is, in
turn, set by material failure. However, combining two different oxidative processes, ultra-violet ozonolysis
followed by air plasma exposure, we break this limit by fabricating trilayer laminates with excellent interfacial
properties and a sequence of moduli and layer thicknesses able to trivially reduce the surface topography
to sub-100 nm dimensions. This method provides a powerful, yet simple, non-lithographic
approach to extend surface patterning from visible to the deep UV range.
Date Issued
2017-01-13
Date Acceptance
2017-01-12
Citation
Nanoscale, 2017, 9 (5), pp.2030-2037
ISSN
2040-3364
Publisher
Royal Society of Chemistry
Start Page
2030
End Page
2037
Journal / Book Title
Nanoscale
Volume
9
Issue
5
Copyright Statement
© 2017 The Royal Society of Chemistry.
Sponsor
Engineering & Physical Science Research Council (EPSRC)
Engineering & Physical Science Research Council (EPSRC)
Identifier
http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000395594300034&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=1ba7043ffcc86c417c072aa74d649202
Grant Number
EP/L022176/1
EP/L020564/1
Subjects
Science & Technology
Physical Sciences
Technology
Chemistry, Multidisciplinary
Nanoscience & Nanotechnology
Materials Science, Multidisciplinary
Physics, Applied
Chemistry
Science & Technology - Other Topics
Materials Science
Physics
CHEMICAL-VAPOR-DEPOSITION
ELECTRON-BEAM LITHOGRAPHY
THIN-FILMS
COMPLIANT SUBSTRATE
ELASTOMERIC POLYMER
ORDERED STRUCTURES
PLASMA OXIDATION
SURFACE
FABRICATION
NETWORKS
10 Technology
02 Physical Sciences
03 Chemical Sciences
Publication Status
Published