The wide application of graphene in the industry requires the direct growth of graphene films on silicon substrates. In this study, we found a possible technique to meet the requirement above. Multilayer graphene thin films (MLG) were grown without a catalyst on Si/SiO2 using pulsed laser deposition (PLD). It was found that the minimum number of laser pulses required to produce fully covered (uninterrupted) samples is 500. This number of laser pulses resulted in samples that contain ~5 layers of graphene. The number of layers was not affected by the laser fluence and the sample cooling rate after the deposition. However, the increase in the laser fluence from 0.9 J/cm2 to 1.5 J/cm2 resulted in a 2.5-fold reduction in the MLG resistance. The present study reveals that the PLD method is suitable to produce nanocrystalline multilayer graphene with electrical conductivity of the same magnitude as commercial CVD graphene samples.