NEMS by sidewall transfer lithography
File(s)STL_NEMS_accepted.pdf (3.44 MB)
Accepted version
Author(s)
Liu, D
Syms, RRA
Type
Journal Article
Abstract
A batch fabrication process for nanoelectromechanical
systems (NEMS) based on sidewall transfer lithography
(STL) is demonstrated. The STL is used to form nanoscale
flexible silicon suspensions entirely by conventional photolithography.
A two-step process for combining microscale and
nanoscale features is used to fabricate double-ended and singleended
electrothermal actuators with a minimum feature width of
100 nm and an aspect ratio of 40:1. All devices are fabricated by
deep reactive ion etching in 4.5-µm-thick silicon using bonded
silicon-on-insulator material. The process could allow low cost
fabrication of nanoscale sensors and actuators.
systems (NEMS) based on sidewall transfer lithography
(STL) is demonstrated. The STL is used to form nanoscale
flexible silicon suspensions entirely by conventional photolithography.
A two-step process for combining microscale and
nanoscale features is used to fabricate double-ended and singleended
electrothermal actuators with a minimum feature width of
100 nm and an aspect ratio of 40:1. All devices are fabricated by
deep reactive ion etching in 4.5-µm-thick silicon using bonded
silicon-on-insulator material. The process could allow low cost
fabrication of nanoscale sensors and actuators.
Date Issued
2014-04-08
Date Acceptance
2014-03-20
Citation
Journal of Microelectromechanical Systems, 2014, 23 (6), pp.1366-1373
ISSN
1057-7157
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Start Page
1366
End Page
1373
Journal / Book Title
Journal of Microelectromechanical Systems
Volume
23
Issue
6
Copyright Statement
© 2014 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
Subjects
Science & Technology
Technology
Engineering, Electrical & Electronic
Engineering, Mechanical
Engineering
Nanoelectromechanical systems (NEMS)
side-wall transfer lithography (STL)
SPACER PATTERNING TECHNOLOGY
SIZE-REDUCTION LITHOGRAPHY
PLATINUM NANOWIRE ARRAYS
EDGE-DEFINED NANOWIRES
NANOIMPRINT LITHOGRAPHY
TEMPLATE FABRICATION
DEFINITION TECHNIQUE
NM
SILICON
LINES
Nanoscience & Nanotechnology
0906 Electrical And Electronic Engineering
Publication Status
Published